石墨烯以其独特的二维结构和高的热导电性、高杨氏模量、高电子/空穴迁移率、高抗拉强度、大的布鲁诺尔-埃米特-特勒表面积和量子霍尔效应等优异性能,备受科研工作者的关注,迅速成为材料、化学、物理和工程领域的热点研究课题。与富勒烯(C60、C70)的功能化一样,利用共价键合修饰或非共价键合修饰的方法可以在石墨烯表面或石墨烯体系中引入功能基团或功能组分,制备出种类繁多的具有特殊光、电、磁和生物效应的石墨烯衍生物。以石墨烯作为数据存储介质的分子级别计算已经引发了一场信息技术产业的革命,它能在更小的空间上,使用更少的能源来存储更多的数据信息, 有望成为目前基于硅半导体存储技术的潜在替代或补充技术。基于石墨烯的存储器件展现出优良的数据存储性能、器件稳定性和可靠性,为使这类器件具有更好的实际应用前景,人们采用许多技术手段来调控和优化器件性能。本文综述了近年来引起广泛关注的诸如石墨烯、共价修饰的石墨烯、石墨烯基复合材料、石墨烯/无机材料异质结等基于石墨烯及其衍生物的存储器件及相关材料研究进展,以及石墨烯/还原的氧化石墨烯透明电极在存储器件中的应用。探讨了该领域存在的亟待解决的关键基础问题和未来发展方向。
[1] Novoselov K S, Geim A K, Morozov S V, Jiang D, Zhang Y, Dubonos S V, Grigorieva I V, Firsov A A. Science, 2004, 306: 666.
[2] Wu J, Pisula W, Muellen K. Chem. Rev., 2007, 107: 718.
[3] Chen F, Tao N. J. Acc. Chem. Res., 2009, 42: 429.
[4] Dreyer D R, Ruoff R S, Bielawski C W. Angew. Chem. Int. Ed., 2010, 49: 9336.
[5] Chen Y, Zhang B, Liu G, Zhuang X D, Kang E T. Chem. Soc. Rev., 2012, 41: 4688.
[6] Ritter K A, Lyding J W. Nanotechnology, 2008, 19: 015704.
[7] Berger C, Song Z, Li X, Wu X, Brown N, Naud C, Mayou D, Li T, Hass J, Marchenkov A N, Conrad E H, First P N, de Heer W A. Science, 2006, 312: 1191.
[8] Ohta T, Bostwick A, Seyller T, Horn K, Rotenberg E. Science, 2006, 313: 951.
[9] de Heer W A, Berger C, Wu X, First P N, Conrad E H, Li X, Li T, Sprinkle M, Hass J, Sadowski M L, Potemski M, Martinez G. Solid State Commun., 2007, 143: 92.
[10] Sutter P W, Flege J I, Sutter E A. Nat. Mater., 2008, 7: 406.
[11] Kim K S, Zhao Y, Jang H, Lee S Y, Kim J M, Kim K S, Ahn J H, Kim P, Choi J Y, Hong B H. Nature, 2009, 457: 706.
[12] Reina A, Jia X T, Ho J, Nezich D, Son H B, Bulovic V, Dresselhaus M S, Kong J. Nano Lett., 2009, 9: 30.
[13] Hummers W S, Offeman R E. J. Am. Chem. Soc., 1958, 80: 1339.
[14] Eda G, Fanchini G, Chhowalla M. Nat. Nanotechnol., 2008, 3: 270.
[15] Yang X, Dou X, Rouhanipour A, Zhi L, Raeder H J, Muellen K. J. Am. Chem. Soc., 2008, 130: 4216.
[16] Rouhanipour A, Roy M, Feng X, Raeder H J, Muellen K. Angew. Chem. Int. Ed., 2009, 48: 4602.
[17] Lu H, Lipatov A, Ryu S, Kim D J, Lee H, Zhuravlev M Y, Eom C B, Tsymbal E Y, Sinitskii A, Gruverman A. Nat. Commun., 2014, 5: 5518.
[18] Lai Y C, Hsu F C, Chen J Y, He J H, Chang T C, Hsieh Y P, Lin T Y, Yang Y J, Chen Y F. Adv. Mater., 2013, 25: 2733.
[19] Qian M, Pan Y M, Liu F Y, Wang M, Shen H L, He D W, Wang B G, Shi Y, Miao F, Wang X R. Adv. Mater., 2014, 26: 3275.
[20] Kim W H, Park C S, Son J Y. Carbon, 2014, 79: 388.
[21] Jeon H, Park J, Jang W, Kim H, Ahn S, Jeon K J, Seo H, Jeon H. Carbon, 2014, 75: 209.
[22] Lai Y C, Huang Y C, Lin T Y, Wang Y X, Chang C Y, Li Y X, Lin T Y, Ye B W, Hsieh Y P, Su W F, Yang Y J, Chen Y F. Npg Asia Materials, 2014, 6: e87.
[23] Yu W J, Chae S H, Lee S Y, Duong D L, Lee Y H. Adv. Mater., 2011, 23: 1889.
[24] Yao J, Lin J, Dai Y H, Ruan G D, Yan Z, Li L, Zhong L, Natelson D, Tour J M. Nat. Commun., 2012, 3: 1101.
[25] Park W I, Yoon J M, Park M, Lee J, Kim S K, Jeong J W, Kim K, Jeong H Y, Jeon S, No K S, Lee J Y, Jung Y S. Nano Lett., 2012, 12: 1235.
[26] Son J Y, Shin Y H, Kim H, Jang H M. ACS Nano, 2010, 4: 2655.
[27] Chakrabarti B, Roy T, Vogel E M. IEEE Electron Device Letters, 2014, 35: 750.
[28] Lai Y C, Wang Y X, Huang Y C, Lin T Y, Hsieh Y P, Yang Y J, Chen Y F. Adv. Funct. Mater., 2014, 24: 1430.
[29] Ji Y, Lee S, Cho B, Song S, Lee T. ACS Nano, 2011, 5: 5995.
[30] Yang P K, Chang W Y, Teng P Y, Jeng S F, Lin S J, Chiu P W, He J H. Proceedings of the IEEE, 2013, 101: 1732.
[31] Yang Y C, Lee J, Lee S, Liu C H, Zhong Z H, Lu W. Adv. Mater., 2014, 26: 3693.
[32] Xu Y, Liu Z, Zhang X, Wang Y, Tian J, Huang Y, Ma Y, Zhang X, Chen Y. Adv. Mater., 2009, 21: 1275.
[33] Park S, Ruoff R S. Nat. Nanotechnol., 2009, 4: 217.
[34] Sze S M, Ng K K. Physics of Semiconductor Devices. 3rd ed. New Jersey: John Wiley & Sons, 2007. 832.
[35] Wegener H A R, Lincoln A J, Pao H C, O'Connell M R, Oleksiak R E, Lawrence H. The Variable Threshold Transistor, A New Electrically-Alterable, Non-Destructive Read-Only Storage Device (Eds. Wade G). New York: IEEE, 1968. 420.
[36] Kagan C R, Andry P. Thin-Film transistors. New York: Marcel Dekker, 2003. 32.
[37] Chen D, Tang L, Li J. Chem. Soc. Rev., 2010, 39: 3157.
[38] Huang X, Qi X Y, Boey F, Zhang H. Chem. Soc. Rev., 2012, 41: 666.
[39] Meng J L, Shi D X, Zhang G Y. Modern Physics Letters B, 2014, 28: 1430009.
[40] Dedkov Y S, Fonin M, Rudiger U, Laubschat C. Phys. Rev. Lett., 2008, 100: 107602.
[41] He C L, Shi Z W, Zhang L C, Yang W, Yang R, Shi D X, Zhang G Y. ACS Nano, 2012, 6: 4214.
[42] Son D I, Kim T W, Shim J H, Jung J H, Lee D U, Lee J M, Park W, Choi W K. Nano Lett., 2010, 10: 2441.
[43] Son D I, Shim J H, Park D H, Jung J H, Lee J M, Park W, Kim T W, Choi W K. Nanotechnology, 2011, 22: 295203.
[44] Ji Y, Choe M, Cho B, Song S, Yoon J, Ko H C, Lee T. Nanotechnology, 2012, 23: 105202.
[45] Wu C X, Li F S, Guo T L. Appl. Phys. Lett., 2014, 104: 183105.
[46] Wu C X, Li F S, Guo T L, Kim T W. Organic Electronics, 2012, 13: 178.
[47] Li Y, Sinitskii A, Tour J M. Nat. Mater., 2008, 7: 966.
[48] Chung D S, Lee S M, Back J Y, Kwon S K, Kim Y H, Chang S T. ACS Appl. Mater. Interfaces, 2014, 6: 9524.
[49] Han S T, Zhou Y, Yang Q D, Zhou L, Huang L B, Yan Y, Lee C S, Roy V A L. ACS Nano, 2014, 8: 1923.
[50] Hong A J, Song E B, Yu H S, Allen M J, Kim J, Fowler J D, Wassei J K, Park Y, Wang Y, Zou J, Kaner R B, Weiller B H, Wang K L. ACS Nano, 2011, 5: 7812.
[51] Imam S A, Deshpande T, Guermoune A, Siaj M, Szkopek T. Appl. Phys. Lett., 2011, 99: 082109.
[52] Zhang C X, Zhang E X, Fleetwood D M, Alles M L, Schrimpf R D, Song E B, Kim S M, Galatsis K, Wang K L W. IEEE Transactions on Nuclear Science, 2012, 59: 2974.
[53] Jie W J, Hui Y Y, Chan N Y, Zhang Y, Lau S P, Hao J H. J. Phys. Chem. C, 2013, 117: 13747.
[54] Song E B, Lian B, Kim S M, Lee S, Chung T K, Wang M S, Zeng C F, Xu G Y, Wong K, Zhou Y, Rasool H I, Seo D H, Chung H J, Heo J, Seo S, Wang K L. Appl. Phys. Lett., 2011, 99: 042109.
[55] Wang X M, Xie W G, Du J, Wang C L, Zhao N, Xu J B. Adv. Mater., 2012, 24: 2614.
[56] Wu C X, Li F S, Zhang Y G, Guo T L. Appl. Phys. Lett., 2012, 100: 042105.
[57] Kim Y D, Bae M H, Seo J T, Kim Y S, Kim H, Lee J H, Ahn J R, Lee S W, Chun S H, Park Y D. ACS Nano, 2013, 7: 5850.
[58] Kim S M, Song E B, Lee S, Zhu J F, Seo D H, Mecklenburg M, Seo S, Wang K L. ACS Nano, 2012, 6: 7879.
[59] Standley B, Bao W Z, Zhang H, Bruck J, Lau C N, Bockrath M. Nano Lett., 2008, 8: 3345.
[60] Wang H M, Wu Y H, Cong C X, Shang J Z, Yu T. ACS Nano, 2010, 4: 7221.
[61] Di Bartolomeo A, Giubileo F, Santandrea S, Romeo F, Citro R, Schroeder T, Lupina G. Nanotechnology, 2011, 22: 275702.
[62] Echtermeyer T J, Lemme M C, Baus M, Szafranek B N, Geim A K, Kurz H. IEEE Electron Device Letters, 2008, 29: 952.
[63] Zhang H, Bao W Z, Zhao Z, Huang J W, Standley B, Liu G, Wang F L, Kratz P, Jing L, Bockrath M, Lau C N. Nano Lett., 2012, 12: 1772.
[64] Gunlycke D, Areshkin D A, Li J W, Mintmire J W, White C T. Nano Lett., 2007, 7: 3608.
[65] Sinitskii A, Tour J M. ACS Nano, 2009, 3: 2760.
[66] Sinitskii A, Dimiev A, Kosynkin D V, Tour, J M. ACS Nano, 2010, 4: 5405.
[67] Jung I, Son J Y. Carbon, 2012, 50: 3854.
[68] Hong S K, Kim J E, Kim S O, Choi S Y, Cho B J. IEEE Electron Device Letters, 2010, 31: 1005.
[69] Liang J J, Chen Y S, Xu Y F, Liu Z B, Zhang L, Zhao X, Zhang X L, Tian J G, Huang Y, Ma Y F, Li F F. ACS Appl. Mater. Interfaces, 2010, 2: 3310.
[70] Hong S K, Kim J E, Kim S O, Cho B J. J. Appl. Phys., 2011, 110: 044506.
[71] Yi M D, Zhao L T, Fan Q L, Xia X H, Ai W, Xie L H, Liu X M, Shi N E, Wang W J, Wang Y P, Huang W J. Appl. Phys., 2011, 110: 063709.
[72] Wang L H, Yang W, Sun Q Q, Zhou P, Lu H L, Ding S J, Zhang D W. Appl. Phys. Lett., 2012, 100: 063509.
[73] Jilani S M, Gamot T D, Banerji P, Chakraborty S. Carbon, 2013, 64: 187.
[74] Kajen R S, Chandrasekhar N, Pey K L, Vijila C, Jaiswal M, Saravanan S, Ng A M H, Wong C P, Loh K P. ECS Solid State Letters, 2013, 2: M17.
[75] Khurana G, Misra P, Katiyar R S. J. Appl. Phys., 2013, 114: 124508.
[76] Nho H W, Kim J Y, Wang J, Shin H J, Choi S Y, Yoon T H. Journal of Synchrotron Radiation, 2014, 21: 170.
[77] He C L, Zhuge F, Zhou X F, Li M, Zhou G C, Liu Y W, Wang J Z, Chen B, Su W J, Liu Z P, Wu Y H, Cui P, Li R W. Appl. Phys. Lett., 2009, 95: 232101.
[78] Zhuge F, Hu B L, He C L, Zhou X F, Liu Z P, Li R W. Carbon, 2011, 49: 3796.
[79] Jeong H Y, Kim J Y, Kim J W, Hwang J O, Kim J E, Lee J Y, Yoon T H, Cho B J, Kim S O, Ruoff R S, Choi S Y. Nano Lett., 2010, 10: 4381.
[80] Kim T W, Gao Y, Acton O, Yip H L, Ma H, Chen H Z, Jen, A K Y. Appl. Phys. Lett., 2010, 97: 023310.
[81] Vasu K S, Sampath S, Sood A K. Solid State Commun., 2011, 151: 1084.
[82] Ho N T, Senthilkumar V, Kim Y S. Solid State Electron., 2014, 94: 61.
[83] Huang X, Zheng B, Liu Z D, Tan C L, Liu J Q, Chen B, Li H, Chen J Z, Zhang X, Fan Z X, Zhang W N, Guo Z, Huo F W, Yang Y H, Xie L H, Huang W, Zhang H. ACS Nano, 2014, 8: 8695.
[84] Rani A, Song J M, Lee M J, Lee J S. Appl. Phys. Lett., 2012, 101: 233308.
[85] Du Z Z, Li W, Ai W, Tai Q, Xie L H, Cao Y, Liu J Q, Yi M D, Ling H F, Li Z H, Huang W. RSC Adv., 2013, 3: 25788.
[86] Mishra A, Janardanan A, Khare M, Kalita H, Kottantharayil A. IEEE Electron Device Letters, 2013, 34: 1136.
[87] Kim C, Song J M, Lee J S, Lee M J. Nanotechnology, 2014, 25: 014016.
[88] Wang Z X, Eigler S, Halik M. Appl. Phys. Lett., 2014, 104: 243502.
[89] Seo S, Yoon Y, Lee J, Park Y, Lee H. ACS Nano, 2013, 7: 3607.
[90] Zhuang X D, Chen Y, Liu G, Li P P, Zhu C X, Kang E T, Neoh K G, Zhang B, Zhu J H, Li Y X. Adv. Mater., 2010, 22: 1731.
[91] Zhang B, Liu Y L, Chen Y, Neoh K G, Li Y X, Zhu C X, Tok E S, Kang E T. Chem. Eur. J., 2011, 17: 10304.
[92] Zhang B, Chen Y, Ren Y J, Xu L Q, Liu G, Kang E T, Wang C, Zhu C X, Neoh K G. Chem. Eur. J., 2013, 19: 6265.
[93] Zhuang X D, Chen Y, Wang L X, Neoh K G, Kang E T, Wang C. Polym. Chem., 2014, 5: 2010.
[94] Wu C X, Li F S, Zhang Y A, Guo T L, Chen T. Appl. Phys. Lett., 2011, 99: 042108.
[95] Zhang B, Liu G, Chen Y, Zeng L J, Zhu C X, Neoh K G, Wang C, Kang E T. Chem. Eur. J. 2011, 17: 13646.
[96] Zhang B, Chen Y, Xu L Q, Zeng L J, He Y, Kang E T, Zhang J J. J. Polym. Sci. Part A: Pol. Chem., 2011, 49: 2043.
[97] Liu G, Zhuang X D, Chen Y, Zhang B, Zhu J H, Zhu C X, Neoh K G, Kang E T. Appl. Phys. Lett., 2009, 95: 253301.
[98] Li G L, Liu G, Li M, Wan D, Neoh K G, Kang E T. J. Phys. Chem. C, 2010, 114: 12742.
[99] Jin C, Lee J, Lee E, Hwang E, Lee H. Chem. Commun., 2012, 48: 4235.
[100] Bhunia P, Hwang E, Min M, Lee J, Seo S, Some S, Lee H. Chem. Commun., 2012, 48: 913.
[101] Cui P, Seo S, Lee J, Wang L, Lee E, Min M, Lee H. ACS Nano, 2011, 5(9): 6826.
[102] Lai Y C, Wang D Y, Huang I S, Chen Y T, Hsu Y H, Lin T Y, Meng H F, Chang T C, Yang Y J, Chen C C, Hsu F C, Chen Y F. J. Mater. Chem. C, 2013, 1: 552.
[103] Chou Y H, Chiu Y C, Chen W C. Chem. Commun., 2014, 50: 3217.
[104] Wu C X, Li F S, Guo T L. Vacuum, 2014, 101: 246.
[105] Zhang Q, Pan J, Yi X, Li L, Shang S M. Organic Electronics, 2012, 13: 1289.
[106] Mamo M A, Sustaita A O, Coville N J, Hummelgen I A. Organic Electronics, 2013, 14: 175.
[107] Velusamy D B, Hwang S K, Kim R H, Song G, Cho S H, Bae I, Park C. J. Mater. Chem., 2012, 22: 25183.
[108] Yu A D, Liu C L, Chen W C. Chem. Commun., 2012, 48: 383.
[109] Wang S A, Manga K K, Zhao M, Bao Q L, Loh K P. Small, 2011, 7: 2372.
[110] Hu B L, Qu R G, Chen C, Zhu G F, Zhu X J, Peng S S, Chen X X, Pan L, Wu Y Z, Zheng W G, Yan Q, Lu J, Li R W. J. Mater. Chem., 2012, 22: 16422.
[111] Kou L J, Li F S, Chen W, Guo T L. Organic Electronics, 2013, 14: 1447.
[112] Mihalache I, Radoi A, Munteanu C, Kusko M, Kusko C. Organic Electronics, 2014, 15: 216.
[113] Obreja A C, Cristea D, Mihalache I, Radoi A, Gavrila R, Comanescu F, Kusko C. Appl. Phys. Lett., 2014, 105: 083303.
[114] Bertolazzi S, Krasnozhon D, Kis A. ACS Nano, 2013, 7: 3246.
[115] Choi M S, Lee G H, Yu Y J, Lee D Y, Lee S H, Kim P, Hone J, Yoo W J. Nat. Commun., 2013, 4: 1624.
[116] Roy K, Padmanabhan M, Goswami S, Sai T P, Ramalingam G, Raghavan S, Ghosh A. Nat. Nanotechnol., 2013, 8: 826.
[117] Zhan N, Olmedo M, Wang G P, Liu J L. Appl. Phys. Lett., 2011, 99: 113112.
[118] Kwon S, Seo H, Lee H, Jeon K J, Park J Y. Appl. Phys. Lett., 2012, 100: 123101.
[119] Lee S, Song E B, Kim S M, Lee Y, Seo D H, Seo S, Wang K L. Appl. Phys. Lett., 2012, 101: 023109.
[120] Myung S, Park J, Lee H, Kim K S, Hong S. Adv. Mater., 2010, 22: 2045.
[121] Han S T, Zhou Y, Wang C D, He L F, Zhang W J, Roy V A L. Adv. Mater., 2013, 25: 872.
[122] Yin Z Y, Zeng Z Y, Liu J Q, He Q Y, Chen P, Zhang H. Small, 2013, 9: 727.
[123] Van't Erve O M J, Friedman A L, Cobas E, Li C H, Robinson J T, Jonker B T. Nat. Nanotechnol., 2012, 7: 737.
[124] Kim I, Siddik M, Shin J, Biju K P, Jung S, Hwang H. Appl. Phys. Lett., 2011, 99: 042101.
[125] Yin Z Y, Sun S Y, Salim T, Wu S X, Huang X A, He Q Y, Lam Y M, Zhang H. ACS Nano, 2010, 4: 5263.
[126] Liu J Q, Lin Z Q, Liu T J, Yin Z Y, Zhou X Z, Chen S F, Xie L H, Boey F, Zhang H, Huang W. Small, 2010, 6: 1536.
[127] Liu J Q, Yin Z Y, Cao X H, Zhao F, Lin A P, Xie L H, Fan Q L, Boey F, Zhang H, Huang W. ACS Nano, 2010, 4: 3987.
[128] Liu J Q, Zeng Z Y, Cao X H, Lu G, Wang L H, Fan Q L, Huang W, Zhang H. Small, 2012, 8: 3517.
[129] Tian H, Chen H Y, Ren T L, Li C, Xue Q T, Mohammad M A, Wu C, Yang Y, Wong H S P. Nano Lett., 2014, 14: 3214.