环境材料“新秀”零价硅：氧化膜的限制与突破

杨世迎; 刘沐桓

doi:10.7536/PC20260604

化学进展 ›› :0--1 DOI: 10.7536/PC20260604

扫码查看或转发全文

环境材料“新秀”零价硅：氧化膜的限制与突破

杨世迎 ¹^,²^,³ ,
刘沐桓 ³

作者信息 +

Shiying Yang ¹^,²^,³ ,
Muhuan Liu ³

Author information +

文章历史 +

摘要

硅作为地壳中仅次于氧的第二大丰富元素，储量优势显著，且零价硅（Zero-Valent Silicon，ZVS）可通过成本低廉的光伏废硅等固废资源获取原料，规模化应用潜力突出。更重要的是，ZVS具有强还原性（E⁰(Si⁴⁺/Si⁰) = -0.86 V），且反应后主要产物为二氧化硅或硅酸盐，不会产生二次污染，可以与环境友好共存。然而，正是由于其极强的还原性，使表面极易与氧气等氧化剂发生反应，生成致密的氧化膜，从而显著阻碍ZVS表面的电子转移过程，隔绝ZVS活性位点与反应物的有效接触，导致ZVS的强还原活性难以充分发挥，严重制约其处理效能。虽然在以往的研究中ZVS去除污染物的研究相对分散，但凭借其储量、成本、环境相容性及还原活性等多重突出优势，在未来的污染物去除领域中有望能成为后起之秀。基于此，本文系统梳理现有ZVS在环境污染物去除领域的研究进展，阐述其基础理化性质与结构-性能的内在关联，聚焦表面氧化膜的形成机制、影响因素及对还原活性的调控规律；系统阐明ZVS通过直接还原作用去除污染物的核心机制，以及依托光学特性、多孔结构强化去除效能的作用机理；深入剖析酸洗、碱洗、球磨、液压处理、金属改性、二氧化硅改性、表面活性剂修饰以及硫改性等手段，在破除氧化膜屏障、增强ZVS反应活性方面的作用效果与作用机理；以期推动ZVS这一极具潜力却被忽视的功能材料在环境领域的发展与应用。

Abstract

Silicon is the second most abundant element in the Earth’s crust after oxygen. Zero-valent silicon (ZVS) can be obtained from low-cost waste photovoltaic silicon, showing great potential for large-scale application. ZVS exhibits strong reducibility (E⁰(Si⁴⁺/Si⁰) = -0.86 V), and its oxidation products are merely silica or silicate with no secondary pollution. However, its high reactivity leads to the rapid formation of a dense surface oxide film in contact with oxygen and water. This film blocks interfacial electron transfer and isolates active sites, severely restricting the reductive activity of ZVS. Despite limited research, ZVS is expected to become a rising star for aqueous contaminant decontamination due to its abundant reserves, low cost, environmental compatibility, and strong reducibility. This paper systematically reviews the progress of ZVS in removing aqueous contaminants, clarifies its physicochemical properties and structure-performance relationship, and focuses on the formation, influencing factors, and inhibitory effects of the oxide film. The core mechanism of direct reduction and performance enhancement through optical and porous structures is highlighted. Furthermore, the effects and mechanisms of various treatment methods including acid washing, alkali washing, ball milling, hydraulic treatment, metal modification, silica modification, and surfactant functionalization in disrupting the oxide film barrier and activating ZVS are analyzed in depth. This review aims to promote the development and application of ZVS in environmental remediation.

关键词

零价硅 / 表面氧化膜 / 污染物去除 / 表面作用机理 / 电子迁移调控

Key words

20260604-DOI/img_1.png107.95111.9zero-valent silicon / surface oxide film / aqueous contaminant decontamination / surface interaction mechanism / electron transferring regulation

引用本文

引用格式 ▾

杨世迎, 刘沐桓. 环境材料“新秀”零价硅：氧化膜的限制与突破[J]. 化学进展, , (): 0--1 DOI:10.7536/PC20260604

Shiying Yang, Muhuan Liu. Progress in Chemistry 0--1 DOI:10.7536/PC20260604

登录浏览全文

4963

注册一个新账户忘记密码

参考文献

原文顺序 | 出版日期 | 本文引用

[1]	Li X, Huang D, Huang H, Wang G, Xu W, Lei Y, Zhou W. J. Hazard. Mater., 2026, 507: 141736.

[2]	Zhang L, Yang S Y. Water Res., 2026, 297: 125695.

[3]	Wang X, Tian X, Chen X, Ren L, Geng C. Sol. Energy Mater. Sol. Cells, 2022, 248: 111976.

[4]	Aravelli S L K G, Ramavathu S N. Environ. Challenges, 2021, 2: 100020.

[5]	Chowdhury M S, Rahman K S, Chowdhury T, Nuthammachot N, Techato K, Akhtaruzzaman M, Tiong S K, Sopian K, Amin N. Energy Strateg. Rev., 2020, 27: 100431.

[6]	Maghraby Y R, Ibrahim A H, Tayel A, Mohamed El-Said Azzazy H, Shoeib T. Sol. Energy, 2025, 285: 113085.

[7]	Yi Y K, Kim H S, Tran T, Hong S K, Kim M J. J. Air Waste Manage. Assoc., 2014, 64: 797.

[8]	Zhao P, Guo J, Yan G, Zhu G, Zhu X, Zhang Z, Zhang B. J. Cleaner Prod., 2020, 257: 120442.

[9]	Dhara A, Chanda D K, Nandi A, Sinha A, Bandyopadhyay N R, Mukherjee N. J. Environ. Chem. Eng., 2020, 8: 103672.

[10]	Elkony A M, Gomaa H A, Omran A A, Attia N F. Sci. Rep., 2025, 15: 32447.

[11]	Fusao ARAI, Hidetaka ASOH, ONO S. Electrochemistry, 2008, 76: 187.

[12]	Liang L-Y, Kung Y-H, Hsiao V K S, Chu C-C. Nanomaterials, 2023, 13: 1805.

[13]	Liu X, Cheng H M, Cui P. Appl. Surf. Sci., 2014, 292: 695.

[14]	Yae S, Nasu N, Matsumoto K, Hagihara T, Fukumuro N, Matsuda H. Electrochim Acta, 2007, 53: 35.

[15]	Halim M, Tan W, Bakar N, Bakar M. 2D Mater., 2014, 7: 7737.

[16]	Hamdi A, Amri C, Ouertani R, Dogheche E, Ezzaouia H. Eur. Phys. J.:Appl. Phys., 2021, 93: 30402.

[17]	Lu G-H, Huang M, Cuma M, Liu F. Surf. Sci., 2005, 588: 61.

[18]	Ouyang G, Gu M X, Fu S Y, Sun C Q, Zhu W G. EPL, 2008, 84: 66005.

[19]	Courtney K M. ISIJ Int., 2000, 40: S130.

[20]	Roome N J, Carey J D. ACS Appl. Mater. Interf, 2014, 6: 7743.

[21]	Mandich M.L, Reents W.D, Kolenbrander K.D. Pure Appl. Chem., 1990, 62: 1652.

[22]	Dean J A. Mater. Manuf. Processes, 1990, 5: 687.

[23]	Burrows V A, Chabal Y J, Higashi G S, Raghavachari K, Christman S B. Appl. Phys. Lett., 1988, 53: 998.

[24]	He Y, Thiry P A, Yu L-M, Caudano R. Surf. Sci., 1995, 331- 333: 441.

[25]	Higashi G S, Chabal Y J, Trucks G W, Raghavachari K. Appl. Phys. Lett., 1990, 56: 656.

[26]	Zhou XW, Ishida M, Imanishi A, Nakato Y. J. Phys. Chem. B, 2001, 105: 156.

[27]	Ogawa H, Ishikawa K, Inomata C, Fujimura S. J. Appl. Phys., 1996, 79: 472.

[28]	Gräf D, Grundner M, Schulz R and Mühlhoff L. J. Appl. Phys., 1990, 68: 5155.

[29]	Ohmi T. J. Electrochem. Soc., 1996, 143: 2957.

[30]	Rappich J, Lewerenz H. J. J. Electrochem. Soc., 1993, 140: L187.

[31]	Rappich J, Lewerenz H. J. Electrochimica Acta, 1996, 41: 675.

[32]	Jakob P, Chabal Y J. J. Chem. Phys., 1991, 95: 2897.

[33]	Rao A.V, Ozanam F, Chazalviel J.-N. J. Electrochem. Soc., 1995, 142: 1233.

[34]	Watanabe S, Shigeno M, Nakayama N, Ito T. Jpn. J. Appl. Phys., 1991, 30: 3575.

[35]	Gräf D, Grundner M, Schulz R. J. Vac. Sci. Technol., A, 1989, 7: 808.

[36]	Rappich J, Lewerenz H. J. J. Electrochem. Soc., 1995, 142: 1233.

[37]	Vatel O, Verhaverbeke S, Bender H, Caymax M, Caollet F, Vernetrf B, Mertens P, Andre E, Heyns M. Jpn. J. Appl. Phys., 1993, 32: L1489.

[38]	Yasaka T, Kania K, Sarara K, Miyazaki S, Hirose M. Jpn. J. Appl. Phys., 1991, 30: 3567.

[39]	Takahagi T, Nagai I, Ishitani A, Kuroda H, Nagasawa Y. J. Appl. Phys., 1988, 64: 3516.

[40]	Niwano M, Kimura Y, Miyamoto N. Appl. Phys. Lett., 1994, 65: 1692.

[41]	Stumper J, Lewerenz H J, Pettenkofer C. Phys. Rev. B, 1990, 41: 1592.

[42]	Miyamoto M, Tatsuno T, Ohta Y. J. Electrochem. Soc., 1993, 140: 2546.

[43]	Niwano M, Kondo Y, Kimura Y. J. Electrochem. Soc., 2000, 147: 1555.

[44]	Aoyama T, Yamazaki T and Ito T. J. Electrochem. Soc., 1992, 61: 102.

[45]	Aoyama T, Yamazaki T, Ito T. Appl. Phys. Lett., 1996, 143: 2280.

[46]	Morita M, Ohmi T, Hasegawa E, Teramoto A. Jpn. J. Appl. Phys., 1990, 29: L2392.

[47]	Morita M, Ohmi T, Hasegawa E, Kawakami M, Ohwada M. J. Appl. Phys., 1990, 68: 1272.

[48]	Massoud H.Z, Plummer J.D, Irene E.A. J. Electrochem. Soc., 1985, 132: 2693.

[49]	Kondoha E, Baklanov M.R, Jonckx F, Maexa K. Mater. Sci. Semicond. Process., 1998, 1: 107.

[50]	Rao A.V, Chazalviel J.-N. J. Electrochem. Soc., 1987, 134: 2777.

[51]	Xiao C, Chen C, Yao Y, Liu H, Chen L, Qian L, Kim S H. Langmuir, 2020, 36: 5483.

[52]	Chabal Y J, Christman S B. Phys. Rev. B, 1984, 29: 6974.

[53]	Niwano M. Surf. Sci., 1999, 427- 428: 199.

[54]	Morita M, Ohmi T, Hasegawa E, Kawakami M, Suma K. Appl. Phys. Lett., 1989, 55: 562.

[55]	Ozanam F., Chazalviel J.-N. J. Electroanal. Chem., 1989, 269: 251.

[56]	De Smedt F, Vinckier C, Cornelissen I, De Gendt S, Heyns M. J. Electrochem. Soc., 2000, 147: 1124.

[57]	Law J.T. J. Phys. Chem. Solids, 1958, 4: 91.

[58]	Rappich J, Lewerenz H. J. J. Electrochem. Soc, 1983, 142: 457.

[59]	Gräf D, Grundner M, Mühlhoff L, Dellith M. J. Appl. Phys., 1991, 69: 7620.

[60]	Loewenstein L M, W. M P. J. Electrochem. Soc., 1998, 145: 2841.

[61]	Ochs H, Bublak D, Wild U, M. Muhler, Kolbesen B O. Appl. Surf. Sci., 1998, 133: 73.

[62]	Mori Y, Uemura K, Shimanoe K. J. Electrochem. Soc., 1995, 142: 3104.

[63]	Doong R A, Lee C C, Chen K T, Wu S-F. Water Sci. Technol., 2004, 50: 89.

[64]	Doong R.A, Chen K.T, Tsai H.C. Environ. Sci. Technol., 2003, 37: 2575.

[65]	Lee C.C, Doong R. Interactions of Nanomaterials with Emerging Environmental Contaminants. Eds.: Doong R. Washington DC: American Chemical Society, 2013, 212.

[66]	Lee C-c, Doong R-a. Appl. Catal.B: Environ., 2014, 144: 182.

[67]	Lee C-c, Doong R-a. Environ. Sci. Technol., 2011, 45: 2301.

[68]	Hu H, Zhang Q, Wang Q, Chen M, Wang C, Wang Z. J. Environ. Chem. Eng., 2023, 11: 111398.

[69]	Wang Q, Zhang Q, Wang C, Hu H, Chen M, Chen M, Jiang L. Colloids Surf., A, 2021, 626: 127020.

[70]	Li K . Master’s Dissertation of Wuhan University of Technology, 2023.

[71]	( 李凯. 武安理工大学硕士论文, 2023 )

[72]	Li K, Wang C, Hu H, Zhang Q. Chem. Eng. J., 2023, 466: 143246.

[73]	Matsumoto A, Abe S, Shimizu N, Osaka T, Kadowaki J, Yae S. Electrochemistry, 2025, 93: 067002.

[74]	Matsumoto A, Takashima Y, Iwai Y, Yae S. Surf. Coat Technol., 2022, 73: 456.

[75]	Fukuda K, Fukumur N, Sakamoto S, Yae S, Yae S. ECS Trans., 2014, 61: 1.

[76]	Miyake H, Ye S, Osawa M. Electrochem. Commun., 2002, 4: 973.

[77]	Yang S, Mao D, Yu Z, Ma W, Ma L, Li X, Xi F. Sci. Total Environ., 2024, 920: 171065.

[78]	Ljungberg K, Jansson U, Bengtsson S, Söderbörg A. J. Electrochem. Soc., 1996, 143: 1709.

[79]	Liu M, Liu J, Sun J, Zhu Y, Chen K, Zhong H, Ouyang L, Liu H. ACS Appl. Mater. Interf, 2023, 15: 20917.

[80]	Zhan C, Chu P K, Ren D, Xin Y, Huo K, Zou Y, Huang N K. Int. J. Hydrogen Energy, 2011, 36: 4513.

[81]	Kobayashi Y, Fujie S, Imamura K, Kobayashi H. Appl. Surf. Sci., 2021, 536: 147398.

[82]	Kobayashi Y, Fujie S, Imamura K, Kobayashi H. J. Nanopart. Res., 2017, 19: 176.

[83]	Xu L, Ashraf S, Hu J, Edwards P P, Jones M O, Hadzifejzovic E, Foord J S. Int. J. Hydrogen Energy, 2016, 41: 12730.

[84]	Bhisikar A, Singh M N, Khantwal N, Sinha A K. Materials Today Communications, 2022, 33: 104138.

[85]	Erogbogbo F, Lin T, Tucciarone P M, LaJoie K M, Lai L, Patki G D, Prasad P N, Swihart M T. Nano Lett., 2013, 13: 451.

[86]	Goller B, Kovalev D, Sreseli O. Nanotechnology, 2011, 22: 305402.

[87]	Liu M, Yao Z, Li W, Zhang J, Li C, Huang X, Zheng J, Zhang L, Fan M. Chem. Eng. J., 2023, 475: 146201.

[88]	Hu Y, Yan H, Liu K, Cao H, Li W. Int. J. Hydrogen Energy, 2015, 40: 8633.

[89]	Brack P, Chillman M, Wijayantha K G U, Adcock P, Foster S, Dann S E. J. Alloys Compd., 2017, 704: 146.

[90]	Doong R-a, Lee C-c. Water Sci. Technol., 2010, 62: 28.

[91]	Lee C.C., Doong R.A. Environ. Sci. Technol., 2008, 42: 4752.

[92]	Santos L d A, Vermeeren P, Bickelhaupt F M, Guerra C F. J. Am. Chem. Soc., 2024, 146: 25701.

[1]	Li X, Huang D, Huang H, Wang G, Xu W, Lei Y, Zhou W. J. Hazard. Mater., 2026, 507: 141736.
[2]	Zhang L, Yang S Y. Water Res., 2026, 297: 125695.
[3]	Wang X, Tian X, Chen X, Ren L, Geng C. Sol. Energy Mater. Sol. Cells, 2022, 248: 111976.
[4]	Aravelli S L K G, Ramavathu S N. Environ. Challenges, 2021, 2: 100020.
[5]	Chowdhury M S, Rahman K S, Chowdhury T, Nuthammachot N, Techato K, Akhtaruzzaman M, Tiong S K, Sopian K, Amin N. Energy Strateg. Rev., 2020, 27: 100431.
[6]	Maghraby Y R, Ibrahim A H, Tayel A, Mohamed El-Said Azzazy H, Shoeib T. Sol. Energy, 2025, 285: 113085.
[7]	Yi Y K, Kim H S, Tran T, Hong S K, Kim M J. J. Air Waste Manage. Assoc., 2014, 64: 797.
[8]	Zhao P, Guo J, Yan G, Zhu G, Zhu X, Zhang Z, Zhang B. J. Cleaner Prod., 2020, 257: 120442.
[9]	Dhara A, Chanda D K, Nandi A, Sinha A, Bandyopadhyay N R, Mukherjee N. J. Environ. Chem. Eng., 2020, 8: 103672.
[10]	Elkony A M, Gomaa H A, Omran A A, Attia N F. Sci. Rep., 2025, 15: 32447.
[11]	Fusao ARAI, Hidetaka ASOH, ONO S. Electrochemistry, 2008, 76: 187.
[12]	Liang L-Y, Kung Y-H, Hsiao V K S, Chu C-C. Nanomaterials, 2023, 13: 1805.
[13]	Liu X, Cheng H M, Cui P. Appl. Surf. Sci., 2014, 292: 695.
[14]	Yae S, Nasu N, Matsumoto K, Hagihara T, Fukumuro N, Matsuda H. Electrochim Acta, 2007, 53: 35.
[15]	Halim M, Tan W, Bakar N, Bakar M. 2D Mater., 2014, 7: 7737.
[16]	Hamdi A, Amri C, Ouertani R, Dogheche E, Ezzaouia H. Eur. Phys. J.:Appl. Phys., 2021, 93: 30402.
[17]	Lu G-H, Huang M, Cuma M, Liu F. Surf. Sci., 2005, 588: 61.
[18]	Ouyang G, Gu M X, Fu S Y, Sun C Q, Zhu W G. EPL, 2008, 84: 66005.
[19]	Courtney K M. ISIJ Int., 2000, 40: S130.
[20]	Roome N J, Carey J D. ACS Appl. Mater. Interf, 2014, 6: 7743.
[21]	Mandich M.L, Reents W.D, Kolenbrander K.D. Pure Appl. Chem., 1990, 62: 1652.
[22]	Dean J A. Mater. Manuf. Processes, 1990, 5: 687.
[23]	Burrows V A, Chabal Y J, Higashi G S, Raghavachari K, Christman S B. Appl. Phys. Lett., 1988, 53: 998.
[24]	He Y, Thiry P A, Yu L-M, Caudano R. Surf. Sci., 1995, 331- 333: 441.
[25]	Higashi G S, Chabal Y J, Trucks G W, Raghavachari K. Appl. Phys. Lett., 1990, 56: 656.
[26]	Zhou XW, Ishida M, Imanishi A, Nakato Y. J. Phys. Chem. B, 2001, 105: 156.
[27]	Ogawa H, Ishikawa K, Inomata C, Fujimura S. J. Appl. Phys., 1996, 79: 472.
[28]	Gräf D, Grundner M, Schulz R and Mühlhoff L. J. Appl. Phys., 1990, 68: 5155.
[29]	Ohmi T. J. Electrochem. Soc., 1996, 143: 2957.
[30]	Rappich J, Lewerenz H. J. J. Electrochem. Soc., 1993, 140: L187.
[31]	Rappich J, Lewerenz H. J. Electrochimica Acta, 1996, 41: 675.
[32]	Jakob P, Chabal Y J. J. Chem. Phys., 1991, 95: 2897.
[33]	Rao A.V, Ozanam F, Chazalviel J.-N. J. Electrochem. Soc., 1995, 142: 1233.
[34]	Watanabe S, Shigeno M, Nakayama N, Ito T. Jpn. J. Appl. Phys., 1991, 30: 3575.
[35]	Gräf D, Grundner M, Schulz R. J. Vac. Sci. Technol., A, 1989, 7: 808.
[36]	Rappich J, Lewerenz H. J. J. Electrochem. Soc., 1995, 142: 1233.
[37]	Vatel O, Verhaverbeke S, Bender H, Caymax M, Caollet F, Vernetrf B, Mertens P, Andre E, Heyns M. Jpn. J. Appl. Phys., 1993, 32: L1489.
[38]	Yasaka T, Kania K, Sarara K, Miyazaki S, Hirose M. Jpn. J. Appl. Phys., 1991, 30: 3567.
[39]	Takahagi T, Nagai I, Ishitani A, Kuroda H, Nagasawa Y. J. Appl. Phys., 1988, 64: 3516.
[40]	Niwano M, Kimura Y, Miyamoto N. Appl. Phys. Lett., 1994, 65: 1692.
[41]	Stumper J, Lewerenz H J, Pettenkofer C. Phys. Rev. B, 1990, 41: 1592.
[42]	Miyamoto M, Tatsuno T, Ohta Y. J. Electrochem. Soc., 1993, 140: 2546.
[43]	Niwano M, Kondo Y, Kimura Y. J. Electrochem. Soc., 2000, 147: 1555.
[44]	Aoyama T, Yamazaki T and Ito T. J. Electrochem. Soc., 1992, 61: 102.
[45]	Aoyama T, Yamazaki T, Ito T. Appl. Phys. Lett., 1996, 143: 2280.
[46]	Morita M, Ohmi T, Hasegawa E, Teramoto A. Jpn. J. Appl. Phys., 1990, 29: L2392.
[47]	Morita M, Ohmi T, Hasegawa E, Kawakami M, Ohwada M. J. Appl. Phys., 1990, 68: 1272.
[48]	Massoud H.Z, Plummer J.D, Irene E.A. J. Electrochem. Soc., 1985, 132: 2693.
[49]	Kondoha E, Baklanov M.R, Jonckx F, Maexa K. Mater. Sci. Semicond. Process., 1998, 1: 107.
[50]	Rao A.V, Chazalviel J.-N. J. Electrochem. Soc., 1987, 134: 2777.
[51]	Xiao C, Chen C, Yao Y, Liu H, Chen L, Qian L, Kim S H. Langmuir, 2020, 36: 5483.
[52]	Chabal Y J, Christman S B. Phys. Rev. B, 1984, 29: 6974.
[53]	Niwano M. Surf. Sci., 1999, 427- 428: 199.
[54]	Morita M, Ohmi T, Hasegawa E, Kawakami M, Suma K. Appl. Phys. Lett., 1989, 55: 562.
[55]	Ozanam F., Chazalviel J.-N. J. Electroanal. Chem., 1989, 269: 251.
[56]	De Smedt F, Vinckier C, Cornelissen I, De Gendt S, Heyns M. J. Electrochem. Soc., 2000, 147: 1124.
[57]	Law J.T. J. Phys. Chem. Solids, 1958, 4: 91.
[58]	Rappich J, Lewerenz H. J. J. Electrochem. Soc, 1983, 142: 457.
[59]	Gräf D, Grundner M, Mühlhoff L, Dellith M. J. Appl. Phys., 1991, 69: 7620.
[60]	Loewenstein L M, W. M P. J. Electrochem. Soc., 1998, 145: 2841.
[61]	Ochs H, Bublak D, Wild U, M. Muhler, Kolbesen B O. Appl. Surf. Sci., 1998, 133: 73.
[62]	Mori Y, Uemura K, Shimanoe K. J. Electrochem. Soc., 1995, 142: 3104.
[63]	Doong R A, Lee C C, Chen K T, Wu S-F. Water Sci. Technol., 2004, 50: 89.
[64]	Doong R.A, Chen K.T, Tsai H.C. Environ. Sci. Technol., 2003, 37: 2575.
[65]	Lee C.C, Doong R. Interactions of Nanomaterials with Emerging Environmental Contaminants. Eds.: Doong R. Washington DC: American Chemical Society, 2013, 212.
[66]	Lee C-c, Doong R-a. Appl. Catal.B: Environ., 2014, 144: 182.
[67]	Lee C-c, Doong R-a. Environ. Sci. Technol., 2011, 45: 2301.
[68]	Hu H, Zhang Q, Wang Q, Chen M, Wang C, Wang Z. J. Environ. Chem. Eng., 2023, 11: 111398.
[69]	Wang Q, Zhang Q, Wang C, Hu H, Chen M, Chen M, Jiang L. Colloids Surf., A, 2021, 626: 127020.
[70]	Li K . Master’s Dissertation of Wuhan University of Technology, 2023.
	( 李凯. 武安理工大学硕士论文, 2023 )
[71]	Li K, Wang C, Hu H, Zhang Q. Chem. Eng. J., 2023, 466: 143246.
[72]	Matsumoto A, Abe S, Shimizu N, Osaka T, Kadowaki J, Yae S. Electrochemistry, 2025, 93: 067002.
[73]	Matsumoto A, Takashima Y, Iwai Y, Yae S. Surf. Coat Technol., 2022, 73: 456.
[74]	Fukuda K, Fukumur N, Sakamoto S, Yae S, Yae S. ECS Trans., 2014, 61: 1.
[75]	Miyake H, Ye S, Osawa M. Electrochem. Commun., 2002, 4: 973.
[76]	Yang S, Mao D, Yu Z, Ma W, Ma L, Li X, Xi F. Sci. Total Environ., 2024, 920: 171065.
[77]	Ljungberg K, Jansson U, Bengtsson S, Söderbörg A. J. Electrochem. Soc., 1996, 143: 1709.
[78]	Liu M, Liu J, Sun J, Zhu Y, Chen K, Zhong H, Ouyang L, Liu H. ACS Appl. Mater. Interf, 2023, 15: 20917.
[79]	Zhan C, Chu P K, Ren D, Xin Y, Huo K, Zou Y, Huang N K. Int. J. Hydrogen Energy, 2011, 36: 4513.
[80]	Kobayashi Y, Fujie S, Imamura K, Kobayashi H. Appl. Surf. Sci., 2021, 536: 147398.
[81]	Kobayashi Y, Fujie S, Imamura K, Kobayashi H. J. Nanopart. Res., 2017, 19: 176.
[82]	Xu L, Ashraf S, Hu J, Edwards P P, Jones M O, Hadzifejzovic E, Foord J S. Int. J. Hydrogen Energy, 2016, 41: 12730.
[83]	Bhisikar A, Singh M N, Khantwal N, Sinha A K. Materials Today Communications, 2022, 33: 104138.
[84]	Erogbogbo F, Lin T, Tucciarone P M, LaJoie K M, Lai L, Patki G D, Prasad P N, Swihart M T. Nano Lett., 2013, 13: 451.
[85]	Goller B, Kovalev D, Sreseli O. Nanotechnology, 2011, 22: 305402.
[86]	Liu M, Yao Z, Li W, Zhang J, Li C, Huang X, Zheng J, Zhang L, Fan M. Chem. Eng. J., 2023, 475: 146201.
[87]	Hu Y, Yan H, Liu K, Cao H, Li W. Int. J. Hydrogen Energy, 2015, 40: 8633.
[88]	Brack P, Chillman M, Wijayantha K G U, Adcock P, Foster S, Dann S E. J. Alloys Compd., 2017, 704: 146.
[89]	Doong R-a, Lee C-c. Water Sci. Technol., 2010, 62: 28.
[90]	Lee C.C., Doong R.A. Environ. Sci. Technol., 2008, 42: 4752.
[91]	Santos L d A, Vermeeren P, Bickelhaupt F M, Guerra C F. J. Am. Chem. Soc., 2024, 146: 25701.